Fabrication of 2D Silicon Nano-mold Based on Sidewall Patterning
نویسندگان
چکیده
منابع مشابه
Fabrication of 2D silicon nano-mold based on sidewall transfer
A method based on the sidewall transfer technique for fabricating two-dimensional (2D) nano-mold on a silicon substrate was developed. Instead of using expensive nanolithography, the authors fabricated 2D silicon nano-mold using standard ultraviolet lithography, conformal deposition of gold by radio frequency sputtering, argon sputter etching and deep reactive ion etching (DRIE). This technique...
متن کاملA novel 2D silicon nano-mold fabrication technique for linear nanochannels over a 4 inch diameter substrate
A novel low-cost 2D silicon nano-mold fabrication technique was developed based on Cu inclined-deposition and Ar(+) (argon ion) etching. With this technique, sub-100 nm 2D (two dimensional) nano-channels can be etched economically over the whole area of a 4 inch n-type <100> silicon wafer. The fabricating process consists of only 4 steps, UV (Ultraviolet) lithography, inclined Cu deposition, Ar...
متن کاملRoller-Based Nanoimprinting and Nano-patterning Technologies and Applications
Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this presentation, three types of roller-based nanoimprinting and contact-printing methods developed in NCKU in recent years will be addressed. First of all, a Laser-Assisted Roller Imprinting (LARI) method which can di...
متن کاملNanometer-Scale Patterning on PMMA Resist by Force Microscopy Lithography
Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the ...
متن کاملPhase-matched nonlinear optics via patterning layered materials.
The ease of integration and a large second-order nonlinear coefficient of atomically thin layered two-dimensional (2D) materials presents a unique opportunity to realize second-order nonlinearity in a silicon compatible integrated photonic system. However, the phase-matching requirement for second-order nonlinear optical processes makes the nanophotonic design difficult. We show that by nano-pa...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2010